Conductive film production device "Osmium Plasma Coater"
Solve your problems with electron microscope observation! It is highly effective in preventing charge-up and reducing granularity and thermal damage.
The "Osmium Plasma Coater" is a device for producing conductive thin films for electron microscope samples using the "plasma film formation method in the negative glow region by direct current glow discharge." With the plasma CVD method, amorphous osmium conductive thin films (osmium coating) can be formed in a short time. A highly robust and smooth conductive thin film can be obtained without causing thermal damage to the sample. 【Features】 ■ Fully automatic operation ■ Detachable osmium sublimation chamber/ naphthalene sublimation chamber ■ Ability to check the remaining amount of osmium/naphthalene ■ Short film formation time (a few nm/ a few seconds) ■ Ampoule has a safe structure that breaks inside the sublimation chamber *For more details, please refer to the PDF document or feel free to contact us.
- Company：フィルジェン
- Price：Other
